Electron beam painting device

  • Inventors:
  • Assignees: Hitachi Ltd
  • Publication Date: October 20, 1981
  • Publication Number: JP-S56133826-A

Abstract

PURPOSE:To paint a rough diagram at high speed with a simple mechanism by providing the second electron optics system obtained a big shaping beam in form with higher current density at relatively lower part of the first electron optics system. CONSTITUTION:The second electron generation means and the second electron optics system(s) 15(15A) consisting of an electron beam focusing.shaping means and a track deflecting means are inserted at relatively lower part (lower part of a projection lens 8A or a static deflecting electrode 9) of a focusing.shaping means consisting of an electron generation source 1, lenses and deflectors or the like and the first electron optics system consisting of a deflecting.scanning means. And the shape of the electron beam obtained by the second electron optics system is painted with bigger shape than that obtained by the first electron optics system and with higher current density. In this way, a rough diagram such as the fringe of a minute diagram will be painted at high speed with a simple mechanism.

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