Silicone resist material

Abstract

PURPOSE:To form a pattern by simple and rapid processing when a silicone resist material is irradiated with energy such as UV, X-rays, gamma-rays or electron beams, by using a specified polysiloxane. CONSTITUTION:Polysiloxane having structures represented by formulae I as essential structures is used. In the formula (I), R1 is 1-10C alkyl group, 6-14C substd. or unsubstd. aryl group, at least one of R2-R6 is carboxyl group, phenolic hydroxyl or a group contg. phenolic hydroxyl and each of the remaining groups is H, halogen, alkyl group or the like. In the formula (II), each of R7 and R8 is vinyl group, allyl, gamma-methacryloxypropyl or the like. A simply and rapidly processable silicone resist material is obtd.

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Cited By (4)

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    JP-5078992-B2November 21, 2012旭化成イーマテリアルズ株式会社感光性樹脂組成物
    JP-H03100553-AApril 25, 1991Nippon Telegr & Teleph Corp Resist material and photosensitive resin composition
    US-8043899-B2October 25, 2011Asahi Kasei E-Materials CorporationPhotosensitive resin composition
    WO-2008123224-A1October 16, 2008Asahi Kasei E-Materials CorporationComposition de résine photosensible